Characterisation of tungsten nitride layers and their erosion under plasma exposure in NANO-PSI
Journal article published in 2015 by
D. Alegre 
,
T. Acsente,
A. B. Martin Rojo,
E. Oyarzabal,
F. L. Tabarés,
G. Dinescu,
G. De Temmerman,
R. Birjega,
C. Logofatu,
J. Kovac,
And M. Mozetic
,
T. Acsente,
A. B. Martin Rojo,
E. Oyarzabal,
F. L. Tabarés,
G. Dinescu,
G. De Temmerman,
R. Birjega,
C. Logofatu,
J. Kovac,
And M. Mozetic
Abstract
The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device.