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Hindawi, International Journal of Photoenergy, (2012), p. 1-12, 2012

DOI: 10.1155/2012/767054

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TiO2:(Fe, S) Thin Films Prepared from Complex Precursors by CVD, Physical Chemical Properties, and Photocatalysis

Journal article published in 2012 by V. G. Bessergenev ORCID, M. C. Mateus, D. A. Vasconcelos, J. F. M. L. Mariano ORCID, A. M. Botelho do Rego ORCID, Botelho A. M. Rego, R. Lange, E. Burkel ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

The TiO2thin films were prepared using Ti(dpm)2(OPri)2and Ti(OPri)4(dpm = 2,2,6,6-tetramethylheptane-3,5-dione,Pri= isopropyl) as the precursors. The volatile compounds Fe[(C2H5)2NCS2]3and [(CH3)C]2S2were used to prepare doped TiO2films. The synthesis was done in vacuum or in the presence of Ar and O2. The pressure in the CVD chamber was varied between1.2×10−4 mbar and 0.1 mbar, with the system working either in the molecular beam or gas flow regime. Physical, chemical, and photocatalytic properties of the (Fe, S)-doped TiO2films were studied. Those TiO2:(Fe, S) films prepared from the Ti(OPri)4precursor show increased photocatalytic activities, very close to those of Degussa P25 powder in UV region.