High-field scanning probe lithography in hexadecane was demonstrated by transitioning from field induced oxidation to solvent decomposition through surface modification. Water dissolved in the solvent on a hydrophilic surface and forms a meniscus between the tip and the sample due to capillary condensation and displaces the solvent from the active region, resulting in local field induced oxidation of the silicon substrate. Both the probe of the atomic force microscope and the sample are immersed in the solvent to carry out the patterning and the initial images of the nanostructure. The results obtained after patterning of a hydrophilic silicon oxide surface and hydrophobic TMS terminated surface were investigated using a process flow. The hydrophobic surface was obtained via passivation of the silicon surface with hexamethyldisilizane (HMDS). The results show that a simple change in the reaction condition enables the tuning of the imaging tone from positive to negative or vice-versa.