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Wiley, physica status solidi (c), 6(3), p. 1927-1930, 2006

DOI: 10.1002/pssc.200565411

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Depth profiling of ion‐implanted AlInN using time‐of‐flight secondary ion mass spectrometry and cathodoluminescence

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Investigation of the depth profiles and luminescence of Eu and Er-ions implanted into AlInN/GaN bilayers differentiates between ions located in the two different III-N hosts. Differences between samples implanted using channeling or off-axis geometries are studied using time-of-flight secondary ion mass spectometry. A fraction of ions have crossed the AlInN layer (either 130 or 250 nm thick) and reached the underlying GaN. Cathodoluminescence spectra as a function of incident electron energy and photoluminescence excitation data distinguish between ions within AlInN and GaN. The RE emission from the AlInN is broader and red-shifted and the dependence of the intensity on host is discussed. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)