Published in
2007 Conference on Lasers and Electro-Optics (CLEO)
DOI: 10.1109/cleo.2007.4452704
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Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Journal article published in 2007 by
P. W. Wachulak 
,
M. G. Capeluto,
M. C. Marconi,
C. S. Menoni,
J. J. Rocca
,
M. G. Capeluto,
M. C. Marconi,
C. S. Menoni,
J. J. Rocca
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Abstract
Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top lambda=46.9 nm wavelength laser. Patterns of different geometries with features ~60 nm FWHM were printed controlling the exposure dose.