Low-Temperature Combustion-Synthesized Nickel Oxide Thin Films as Hole-Transport Interlayers for Solution-Processed Optoelectronic Devices
Journal article published in 2013 by
Sai Bai,
Motao Cao,
Yizheng Jin,
Xinliang Dai,
Xiaoyong Liang,
Zhizhen Ye,
Min Li,
Jipeng Cheng,
Xuezhang Xiao,
Zhongwei Wu,
Zhouhui Xia,
Baoquan Sun 
,
Ergang Wang,
Yueqi Mo,
Feng Gao
and other authors.
,
Ergang Wang,
Yueqi Mo,
Feng Gao
and other authors.
This paper is available in a repository.
Full text: Download
Published version:
archiving forbidden
Data provided by 
Abstract
A method to deposit NiOx thin films by employing combustion reactions is reported and a low processing temperature of 175 C is demonstrated. The resulting NiOx films exhibit high work functions, excellent optical transparency, and flat surface features. The NiOx thin films are employed as hole-transport interlayers in organic solar cells and polymer light-emitting diodes, exhibiting superior electrical properties.