Published in
IOP Publishing, Japanese Journal of Applied Physics, No. 3(45), p. L102-L104, 2006
DOI: 10.1143/jjap.45.l102
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InP Etching by HI/Xe Inductively Coupled Plasma for Photonic-Crystal Device Fabrication
Journal article published in 2006 by
Toshihide Ide,
Jun-Ichi Hashimoto,
Kengo Nozaki,
Eiichi Mizuta,
Toshihiko Baba
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Abstract
We investigated the inductively coupled plasma etching of InP-based materials for photonic-crystal (PC) device fabrication. By optimizing bias power and gas pressure, circular holes with a diameter of