All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities
Journal article published in 2014 by
Abdelhamid Ghrib,
Moustafa El Kurdi,
Moustafa El Kurdi,
Mathias Prost,
Sébastien Sauvage 
,
Xavier Checoury,
Grégoire Beaudoin,
Marc Chaigneau,
Razvigor Ossikovski,
Isabelle Sagnes,
Philippe Boucaud
,
Xavier Checoury,
Grégoire Beaudoin,
Marc Chaigneau,
Razvigor Ossikovski,
Isabelle Sagnes,
Philippe Boucaud
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Abstract
An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.