Langmuir probes with variants such as single, double and triple probes remain the most common method of electron temperature measurement in low-temperature laboratory plasmas. However, proper estimation of electron temperature mainly using triple probe configuration requires the proper choice of compensation factor ( W ). Determination of the compensating factor is not very straightforward as it depends heavily on plasma floating potential ( V f ), electron temperature ( T e ), the type of gas used for plasma production and the bias voltage applied to probe pins, especially in cases where there are substantial variations in floating potential. In this paper we highlight the anomaly in electron temperature measurement using double and triple Langmuir probe techniques as well as the proper determination of the compensation factor ( W ) to overcome this anomaly. Experiments are carried out with helicon antenna producing inductive radiofrequency plasmas, where significant variation of floating potential along the axis enables a detailed study of deviations introduced in T e measurements using triple probes compared to double and single probes. It is observed that the bias voltage between the probe pins of the triple probes plays an important role in the accurate determination of the compensating factor ( W ) and should be in the range (5 V d 2 < V d 3 < 10 V d 2 ), where V d 2 and V d 3 are the voltage between floating probe pins 2 and 1 and the bias voltage, respectively.