Institute of Electrical and Electronics Engineers, IEEE Transactions on Nanotechnology, 6(11), p. 1122-1125, 2012
DOI: 10.1109/tnano.2012.2214788
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In recent years, resistance changes random access memory (RRAM) which shows reversible bistable resistance states by applied voltage has been studied as one of the alternatives of next-generation nonvolatile memory due to its excellent device characteristics including scalability, speed, and retention. Here, we report on the noncharge-based NiO RRAM device characteristics with load resistor as well as the simulation results of controlled conducting filament configuration. The RRAM device with load resistor showed super performances including highly reduction of switching current (~1 order) and significantly improved switching voltage distribution (30% reduction).