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Carbon Nanostructures, p. 187-193

DOI: 10.1007/978-3-642-20644-3_23

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UV Lithography On Graphene Flakes Produced By Highly Oriented Pyrolitic Graphite Exfoliation Through Polydimethylsiloxane Rubbing

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Graphene is a promising candidate in sensing applications; indeed thanks to its two-dimensionality, it provides the highest surface vo-lume ratio, allowing all its atoms to be totally exposed to the adsorbing gas molecules. Due to several technological limits in production and manipulation of graphene as well as the device fabri-cation, the synthesis of graphene is still far from a well-settled pro-cess. This work aims to illustrate an approach for the graphene prep-aration that is based on the mechanical exfoliation and circumvents some difficulties encountered in a graphene based nanodevice pro-duction. Relying on that fabrication technique a chemiresistive sen-sor device was prepared. Preliminary findings showed that the de-vice responds to a toxic gas such as NO2, up to a few ppm, and reducing gases, such as NH3, to few hundred ppm, at room tempera-ture in controlled environments.