Dissemin is shutting down on January 1st, 2025

Published in

Elsevier, Diamond and Related Materials, 7-10(17), p. 1330-1334, 2008

DOI: 10.1016/j.diamond.2008.01.087

Links

Tools

Export citation

Search in Google Scholar

Characterization of boron doped diamond epilayers grown in a NIRIM type reactor

This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

Boron doped diamond layers have been grown on (100) single crystal substrates in a wide range of boron concentration. The boron doped layers have been electrically and optically characterized. Boron doped layers with Hall mobility closes to natural diamond holes mobility have been obtained. The films morphology has been observed by scanning electron microscopy and their purity has been assessed by cathodoluminescence. Fourier Transform Photocurrent spectroscopy results show the evolution of the photo-ionization onset and the excited states as boron concentration in the films increases.