A structural characterization of thin InN films is performed to determine the post-growth strain distribution, using electron microscopy techniques. A 60° misfit dislocation network at the InN∕GaN interface effectively accommodates the lattice mismatch. The InN in-plane lattice parameter, which remained practically constant throughout the epilayer thickness, was precisely determined by electron diffraction analysis, and cross-section and plan-view lattice images. Image analysis using the geometric phase and projection methods revealed a uniform distribution of the residual tensile strain along the growth and lateral directions. The in-plane strain is primarily attributed to InN island coalescence during the initial stages of growth.