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Springer, Journal of Materials Science, 2(29), p. 404-411, 1994

DOI: 10.1007/bf01162499

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Structure and morphology of titanium nitride films deposited by laser-induced chemical vapour deposition

Journal article published in 1994 by A. J. Silvestre ORCID, O. Conde ORCID, R. Vilar, M. Jeandin
This paper is available in a repository.
This paper is available in a repository.

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Abstract

Results on the deposition of titanium nitride on AISI M2 tool steel-type substrates by pyrolytic laser chemical vapour deposition are reported. Spots of TiN were deposited from a gas mixture of TiCI4, nitrogen and hydrogen using a continuous wave quasi-TEMoo C02 laser beam. The morphology and the structure of the deposited material were investigated by optical microscopy, scanning electron microscopy and X-ray diffraction. The chemical composition was studied with a scanning electron microscope with an energy dispersive spectrometer, and with an electron probe microanalyser. The topography of the coating was analysed with a stylus profilometer and different thickness profiles were measured depending on the laserpower densities and irradiation times. The morphology of the films showed a strong dependence on the laser-power density, interaction time and partial pressure of TiCI4.