Dissemin is shutting down on January 1st, 2025

Published in

Springer, Journal of Materials Science, 2(29), p. 404-411, 1994

DOI: 10.1007/bf01162499

Links

Tools

Export citation

Search in Google Scholar

Structure and morphology of titanium nitride films deposited by laser-induced chemical vapour deposition

Journal article published in 1994 by A. J. Silvestre ORCID, O. Conde ORCID, R. Vilar ORCID, M. Jeandin
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

Results on the deposition of titanium nitride on AISI M2 tool steel-type substrates by pyrolytic laser chemical vapour deposition are reported. Spots of TiN were deposited from a gas mixture of TiCI4, nitrogen and hydrogen using a continuous wave quasi-TEMoo C02 laser beam. The morphology and the structure of the deposited material were investigated by optical microscopy, scanning electron microscopy and X-ray diffraction. The chemical composition was studied with a scanning electron microscope with an energy dispersive spectrometer, and with an electron probe microanalyser. The topography of the coating was analysed with a stylus profilometer and different thickness profiles were measured depending on the laserpower densities and irradiation times. The morphology of the films showed a strong dependence on the laser-power density, interaction time and partial pressure of TiCI4.