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Optica, Optics Express, 20(16), p. 15958, 2008

DOI: 10.1364/oe.16.015958

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Accurate frequency alignment in fabrication of high-order microring-resonator filters

Journal article published in 2008 by Jie Sun, Charles W. Holzwarth, Marcus Dahlem ORCID, Jeffrey T. Hastings, Henry I. Smith
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6 GHz to 0.28 GHz.