2011 37th IEEE Photovoltaic Specialists Conference
DOI: 10.1109/pvsc.2011.6185966
Full text: Unavailable
A CdSxTe1−x layer forms by interdiffusion of CdS and CdTe during the fabrication of thin-film CdTe photovoltaic (PV) devices. The CdSxTe1−x layer is thought to be important because it relieves strain at the CdS/CdTe interface that would otherwise exist due to the 10% lattice mismatch between these two materials. Our previous work [1] has indicated that the electrical junction is located in this interdiffused CdSxTe1−x region. Further understanding, however, is essential to predict the role of this CdSxTe1−x layer in the operation of CdS/CdTe devices. In this study, CdSxTe1−x alloy films were deposited by radio-frequency (RF) magnetron sputtering and co-evaporation from CdTe and CdS sources. Both RF-magnetron-sputtered and co-evaporated CdSxTe1−x films of lower S content (x