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ECS Meeting Abstracts, 15(MA2009-01), p. 709-709, 2009

DOI: 10.1149/ma2009-01/15/709

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Fabrication of ultra shallow junction formation using plasma doping and excimer laser annealing for nMOSFET

Journal article published in 2009 by Lak-Myung Jung, Lak-Myung Junga, Seung-Woo Do, Seung-Woo Doa, Jae-Min Kim, Jae-Min Kima, Seong-Ho Kong, Ki-Hong Nam, Young-Hyun Lee
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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