Published in
Springer Verlag, Plasma Chemistry and Plasma Processing, 1(31), p. 189-203
DOI: 10.1007/s11090-010-9263-2
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Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid I: Behaviour of Thin Films
Journal article published in 2010 by
E. A. Bernardelli,
T. Belmonte,
D. Duday,
G. Frache,
F. Poncin Epaillard,
C. Noël,
P. Choquet 
,
H.-N. Migeon,
A. Maliska
,
H.-N. Migeon,
A. Maliska
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