Elsevier, Materials Letters, 3(42), p. 166-170
DOI: 10.1016/s0167-577x(99)00177-9
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Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C2H4N4) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with CN, CN and CN bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.