It is shown that it is possible to deposit thin films with various CFx composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.83) by ion-beam sputtering. These materials with ''teflon-like'' composition have been deposited at room temperature by Ar ion-beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine-to-carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.