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Published in

Elsevier, Journal of Crystal Growth, (425), p. 398-400

DOI: 10.1016/j.jcrysgro.2015.02.067

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High power nitride laser diodes grown by plasma assisted molecular beam epitaxy

This paper is available in a repository.
This paper is available in a repository.

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Abstract

The influence of waveguide design on performance of nitride based laser diodes (LDs) grown by plasma assisted molecular beam epitaxy is studied. A large improvement in threshold current density and slope efficiency of LDs is observed when an InGaN interlayer with 8% In content is introduced between multi-quantum-well region and electron blocking layer. This dependence is attributed to reduction of internal losses due to lower optical mode overlap with highly absorptive Mg-doped layers. This led to demonstration of blue LD operating at λ=450 nm with high optical power of 500 mW per facet.