Published in

Elsevier, Current Applied Physics

DOI: 10.1016/j.cap.2011.01.032

Links

Tools

Export citation

Search in Google Scholar

Influence of piezoelectric property on annealing temperature of Ta-substituted (K0.5Na0.5)NbO3 thin films by chemical solution deposition

Journal article published in 2011 by Sun Young Lee, Jin Soo Kim, Chang Won Ahn ORCID, Aman Ullah, Hai Joon Lee, Ill Won Kim
This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Red circle
Postprint: archiving forbidden
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO

Abstract

Lead-free (K0.5Na0.5)(Nb0.7Ta0.3)O3 (KNNT) piezoelectric thin films were prepared on Pt(111)/TiO2/SiO2/Si(100) substrates by chemical solution deposition method. The effects of annealing temperatures 550, 600, 650, 700, and 750 °C on microstructure, leakage current, ferroelectric, and piezoelectric properties of the KNNT thin films were investigated. The largest remanent polarization Pr (10.5 μC/cm2), piezoelectric coefficient d33 (62 pm/V), and lowest leakage current density (4.6 × 10−6 A/cm2 under 120 kV/cm) of the KNNT film were obtained with annealing at 700 °C. The mechanisms concerning the enhancement in d33 are discussed, and the improved piezoelectric performance of the KNNT film suggests a promising candidate for piezoelectric thin film devices.