Society of Photo-optical Instrumentation Engineers, Proceedings of SPIE, 2002
DOI: 10.1117/12.514284
Full text: Unavailable
Gold nanoelectrodes with gaps of less than 10 nm were formed by conventional E-beam lithography on silicon substrates covered by Al2O3. Molecular films were deposited on the electrodes by Langmuir-Shaefer technique. The I-V curves of such systems show a suppressed conductance indicating a correlated electron tunnelling through the system. All measurements were made at room temperature.