Published in
Elsevier, Applied Surface Science, 1-4(211), p. 2-5
DOI: 10.1016/s0169-4332(03)00263-0
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Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine
Journal article published in 2003 by
Christopher S. Blackman,
Claire J. Carmalt 
,
Shane A. O’Neill,
Ivan P. Parkin ,
Leonardo Apostolico,
Kieran C. Molloy
,
Shane A. O’Neill,
Ivan P. Parkin ,
Leonardo Apostolico,
Kieran C. Molloy
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Abstract
Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented.