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Elsevier, Infrared Physics and Technology, 2-3(50), p. 119-123

DOI: 10.1016/j.infrared.2006.10.025

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Normal incidence silicon doped p-type GaAs/AlGaAs quantum-well infrared photodetector on (111)A substrate

Journal article published in 2007 by T. Mei, H. Li, G. Karunasiri, W. J. Fan ORCID, D. H. Zhang, S. F. Yoon, K. H. Yuan
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

p-type quantum-well infrared photodetectors (QWIPs) demonstrate normal incidence response due to band mixing by utilizing valence band transitions that may break the selection rule limiting n-type QWIPs. Due to even more complicated valence band structure in (111) orientation, it is interesting to see that the p-type QWIP show both absorption and photocurrent response dominant in normal incidence. The p-type GaAs/AlGaAs QWIP was fabricated on GaAs(111)A substrate by molecular beam epitaxy (MBE) using silicon as dopant with a measured carrier concentration of 1.4×1018cm−3. The photocurrent spectrum exhibits a peak at a wavelength of 7μm with a relatively broad peak width (Δλ/λp∼50%), indicating that the final state is far deep within the continuum of the valence band. The p-QWIP demonstrates a responsivity of about 1mA/W, which is limited by the relatively low doping concentration.