The influence of redeposition on the space and time evolution of feature profiles during platinum etching in high-density argon plasmas is examined using simulations. The simulator takes into account redeposition resulting from either direct sticking of the sputtered species on the materials walls (line-of-sight redeposition) or from sputtered species returning from plasma (indirect redeposition). Overall, the simulator successfully reproduces experimental profiles sputter etched in platinum, in particular V-shaped profiles reported in literature. From comparison between experimental and simulated profiles at very low pressure, Pt/resist sticking probability was estimated to be 0.1 and the angular spread of the sputtered atom distribution was predicted to be about ±50°. It was further found that indirect redeposition becomes crucial at higher pressure for explaining the amount of redeposited matter.