We report a combined directing effect of the simultaneously applied graphoepitaxy and electric field on the self-assembly of cylinder forming polystyrene-b-poly(dimethylsiloxane) block copolymer in thin films. A correlation length of up to 20 μm of uniaxial ordered striped patterns is an order of magnitude greater than that produced by either graphoepitaxy or electric field alignment alone and is achieved at reduced annealing times. The angle between the electric field direction and the topographic guides as well as the dimensions of the trenches affected both the quality of the ordering and the direction of the orientation of cylindrical domains: parallel or perpendicular to the topographic features. We quantified the interplay between the electric field and the geometry of the topographic structures by constructing the phase diagram of microdomain orientation. This combined approach allows the fabrication of highly ordered block copolymer structures using macroscopically prepatterned photolithographic substrates.