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32nd European Solid-State Device Research Conference

DOI: 10.1109/essderc.2002.194968

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Temperature Dependence of the Hard Breakdown Current of MOS Capacitors

Proceedings article published in 2002 by A. Avellan, E. Miranda ORCID, B. Sell, D. Schroeder, W. Krautschneider
This paper is available in a repository.
This paper is available in a repository.

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Abstract

I-V curves as a function of temperature of broken down n- and p-type MOS capacitors with different oxide thicknesses are presented. In accumulation, a crossover of the temperature dependent curves is observed. At low voltages the hard breakdown current increases with temperature whereas it decreases with temperature for higher voltages. This behaviour can be straightforwardly linked to the available charge for conduction at the electrodes. MINIMOS simulations as well as theoretical considerations were performed that clearly support this idea.