Published in
Elsevier, Applied Surface Science, (283), p. 375-381
DOI: 10.1016/j.apsusc.2013.06.118
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Control of the interfacial reaction in HfO2 on Si-passivated GaAs
Journal article published in 2013 by
Sang Han Park 
,
Yu Seon Kang,
Jimin Chae,
Hyo Jin Kim,
Mann-Ho Cho,
Dae-Hong Ko,
Young-Chul Byun,
Hyoungsub Kim,
Sang Wan Cho,
Chung Yi Kim,
Jung-Hye Seo
,
Yu Seon Kang,
Jimin Chae,
Hyo Jin Kim,
Mann-Ho Cho,
Dae-Hong Ko,
Young-Chul Byun,
Hyoungsub Kim,
Sang Wan Cho,
Chung Yi Kim,
Jung-Hye Seo
This paper is available in a repository.
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