2003 International Symposium on Compound Semiconductors
DOI: 10.1109/iscs.2003.1239898
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We have studied the lateral epitaxial overgrowth by MOCVD of a variety of highly mismatched III-V semiconductors on GaAs substrates. For [001] substrates we determined the oxide stripe orientation that gives the maximum lateral growth rate to be ∼ 25o from [110]. We successfully achieved that lateral overgrowth of InxGa1-xAs alloys on GaAs and found that the use of Bi as a surfactant led to an improvement in the morphology and luminescence uniformity. The studies have been extended to the lateral epitaxial overgrowth of InAs, GaP, and InP.