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Trans Tech Publications, Materials Science Forum, (615-617), p. 117-120

DOI: 10.4028/www.scientific.net/msf.615-617.117

Elsevier, Thin Solid Films, 6(518), p. S159-S161

DOI: 10.1016/j.tsf.2009.10.078

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Extended Study of the Step-bunching Mechanism During the Homoepitaxial Growth of SiC

Journal article published in 2009 by Massimo Camarda ORCID, Antonino La Magna, Andrea Severino, Francesco La Via ORCID
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

We discuss the possible source of surface instabilities (with specific reference to the step bunching phenomena) during the growth of cubic and hexagonal Silicon Carbide polytypes. For this analysis we use: results from super-lattice Kinetic Monte Carlo simulations, atomic force microscope surface analysis and literature data. We show that only hexagonal polytypes with misorientation cut toward the <11-20> direction suffer “intrinsically” the step bunching phenomena (i.e. it are present, independently on the growth conditions) whereas cubic polytypes and hexagonal ones with misorientation cut toward the <10-10> direction do not.