Microcrystalline high quality undoped ZnO thin films were deposited on Si(100) and Corning 1737F glass substrates by a dc magnetron sputtering system. Surface and mechanical properties of ZnO thin films deposited under different deposition conditions (thickness, deposition rate and plasma composition) were investigated. Atomic force microscopy, nanoindentation techniques and scratch tests have been carried out. The lateral grain radius was between 50 and 160 nm. Surface roughness was found to vary from 1·3 to 10·3. In order to measure the real hardness of ZnO thin films grown on Si(100) and glass Continuous Stiffness Measurement technique was used. The hardness was found to be between 11 and 13 GPa for the polycrystalline ZnO almost five times larger than for the corresponding single crystalline material, while scratch tests verified a film structure, thickness, and surface morphology dependency on the mechanical properties for these metal oxide thin films.