Trans Tech Publications, Journal of Metastable and Nanocrystalline Materials, (20-21), p. 775-780, 2004
DOI: 10.4028/www.scientific.net/jmnm.20-21.775
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Nanostructured platinum thin films, with thickness going from 1.31 up to 11.66 nm, have been deposited by vacuum arc plasma. We have measured their electrical resistivity and surface roughness. The resistivity results are compared with theoretical predictions obtained using a quantum mechanical approach.