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Wiley, Advanced Materials, 10(23), p. 1246-1251, 2011

DOI: 10.1002/adma.201003847

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Nanosphere Lithography for the Fabrication of Ultranarrow Graphene Nanoribbons and On- Chip Bandgap Tuning of Graphene

Journal article published in 2011 by Lei Liu ORCID, Yingli Zhang, Wenlong Wang, Changzhi Gu, Xuedong Bai, Enge Wang
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

An innovative approach for the high-throughput, rapid, and low-cost fabrication of ultranarrow graphene nanoribbons (GNRs) using nanosphere lithography (NSL) nanopatterning in combination with low-power O-2 plasma etching is presented. The intrinsic simplicity of NSL patterning enables this fabrication approach to be applicable for the straightforward on-chip fabrication of GNRs and bandgap tuning of graphene.