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Elsevier, Scripta Materialia, 9(68), p. 659-662, 2013

DOI: 10.1016/j.scriptamat.2013.01.030

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Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices

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This paper is available in a repository.

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Abstract

RuN films that crystallized in the ZnS-like structure with [111] preferred orientation have been deposited by reactive sputtering. Preliminary results are reported on the electrochemical properties of such films as electrode materials for supercapacitors and lithium-ion batteries. Cyclic voltammetric experiments indicate an attractive capacitance value of 37 F g(-1). Moreover, galvanostatic measurements indicate that RuN films reversibly react with lithium through a conversion reaction with Ru(0) nanoparticle formation. A high capacity value of similar to 700 mAh g(-1) at C/2 rate is achievable.