MAIK Nauka/Interperiodica, Protection of Metals and Physical Chemistry of Surfaces, 2(48), p. 211-216
DOI: 10.1134/s2070205112020062
Full text: Unavailable
The physicochemical properties of amorphous silica prepared by the fluoride technology are studied; the surface of silica is modified by direct fluorination with F2 gas or cC4F8 radio frequency plasma. The modification of the surface physical chemical properties after fluorination are compared with the initial silica and analyzed by X-ray photoelectron spectroscopy, IR spectroscopy, and transmission electron microscopy.