Published in

The Royal Society, Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, 1864(366), p. 437-446, 2007

DOI: 10.1098/rsta.2007.2101

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Experimental observation of a torus doubling of a metal/ferroelectric film/semiconductor capacitor

Journal article published in 2007 by M. Diestelhorst, K. Barz, H. Beige, M. Alexe ORCID, D. Hesse
This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

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Abstract

A metal–ferroelectric–semiconductor (MFS) structure was used as a nonlinear capacitor in a series resonance circuit. The following materials were used as components of the MFS structure: aluminium as the metal electrode, Bi 4 Ti 3 O 12 film as the ferroelectric, and p-type silicon as the semiconductor. The system was driven by a single frequency at suitably chosen amplitudes. Besides the sequences of period-doubling bifurcations which were already observed in the series resonance circuit with a pure ferroelectric capacitor, we found regions with torus-doubling bifurcations by varying the frequency of the driving voltage at suitably high amplitudes. Comparing the behaviour of the series resonance circuit with a pure ferroelectric capacitor and with the MFS structure, we attribute the reason for the new effect of torus doubling to the properties of the ferroelectric–semiconductor boundary layer.