Published in
American Institute of Physics, The Journal of Chemical Physics, 6(142), p. 064702, 2015
DOI: 10.1063/1.4907375
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On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process
Journal article published in 2015 by
H. Van Bui 
,
Hao van Bui,
Frank B. Wiggers ,
Rainer Friedlein,
Yukiko Yamada-Takamura,
Alexey Y. Kovalgin,
Michel P. de Jong
,
Hao van Bui,
Frank B. Wiggers ,
Rainer Friedlein,
Yukiko Yamada-Takamura,
Alexey Y. Kovalgin,
Michel P. de Jong
This paper is available in a repository.
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