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American Institute of Physics, Applied Physics Letters, 16(86), p. 161902

DOI: 10.1063/1.1906307

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Atomistic modeling of shock-induced void collapse in copper

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Nonequilibrium molecular dynamics (MD) simulations show that shock-induced void collapse in copper occurs by emission of shear loops. These loops carry away the vacancies which comprise the void. The growth of the loops continues even after they collide and form sessile junctions, creating a hardened region around the collapsing void. The scenario seen in our simulations differs from current models that assume that prismatic loop emission is responsible for void collapse. We propose a new dislocation-based model that gives excellent agreement with the stress threshold found in the MD simulations for void collapse as a function of void radius.