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American Chemical Society, Journal of Physical Chemistry B (Soft Condensed Matter and Biophysical Chemistry), 10(102), p. 1736-1744, 1998

DOI: 10.1021/jp973134g

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Electronic, Structural, and Reactive Properties of Ultrathin Aluminum Oxide Films on Pt(111)

Journal article published in 1998 by Karen Wilson ORCID, Adam F. Lee, Christopher Hardacre, Richard M. Lambert
This paper is available in a repository.
This paper is available in a repository.

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Abstract

Low-energy electron diffraction, X-ray photoelectron spectroscopy, high-resolution electron energy-loss spectroscopy, scanning tunneling microscopy, and temperature-programmed reaction spectrometry results are reported for the structural and reactive behavior of alumina films grown on Pt(111) as a function of thickness and oxidation temperature. Submonolayer Al films undergo compete oxidation at 300 K, annealing at 1100 K resulting in formation of somewhat distorted crystalline γ-alumina. Thicker deposits require 800 K oxidation to produce Al2O3, and these too undergo crystallization at 800 K, yielding islands of apparently undistorted γ-alumina on the Pt(111) surface. Oxidation of a p(2 × 2) Pt3Al surface alloy occurs only at >800 K, resulting in Al extraction. These alumina films on Pt(111) markedly increase the coverage of adsorbed SO4 resulting from SO2 chemisorption onto oxygen-precovered surfaces. This results in enhanced propane uptake and subsequent reactivity relative to SO4/Pt(111). A bifunctional mechanism is proposed to account for our observations, and the relevance of these to an understanding of the corresponding dispersed systems is discussed.