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Elsevier, Surface and Coatings Technology, (227), p. 38-41

DOI: 10.1016/j.surfcoat.2012.10.064

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Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

Journal article published in 2013 by Arnaud Cacucci, Stéphane Loffredo, Valérie Potin, Luc Imhoff, Nicolas Martin ORCID
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This paper is available in a repository.

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Abstract

Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.