One of the authors has proposed an electrostatically driven torsional resonator with two degrees of freedom (TDF). The main characteristic of the TDF resonator, in which the electrode gap does not directly affect inconsistencies between low voltage driving and a large range of motion, is reported. The TDF structure is also beneficial for achieving high Q values. However, size reduction was difficult because of the limitations of the fabrication process. In this study, the TDF resonator is miniaturized by the UV-LIGA (UV exposed lithography and electroplated structure) process. The process and the frequency characteristics of the resonator are reported.concerns the design and characterization of a new kind of crystalline silicon microresonator fabricated using a DRIE (Deep Reactive Ion Etching) technique. This device can be fabricated by IC compatible techniques. This kind of microresonators is electrostatically actuated and uses a contour or Lam mode as fundamental mode of vibration. Its size gives the resonant frequency and behavior. The mechanical characterization of one microresonator is carried out using an optical bench set-up. The first results obtained on a device show a high Q factor in air close to 1000 at the resonant frequency of 10.3 MHz.