The growing place of electronics devices in our society increases the demand of small devices such as RF filters, time references and oscillators. The aim of this work concerns the design and characterization of a new kind of crystalline silicon microresonator fabricated using a DRIE (Deep Reactive Ion Etching) technique. This device can be fabricated by IC compatible techniques. This kind of microresonators is electrostatically actuated and uses a contour or Lamý mode as fundamental mode of vibration. Its size gives the resonant frequency and behavior. The mechanical characterization of one microresonator is carried out using an optical bench set-up. The first results obtained on a device show a high Q factor in air close to 1000 at the resonant frequency of 10.3 MHz.