High selective plasma etching for PMMA of block-copolymer in Directed-Self Assembly
Proceedings article published in 2012 by
Boon Teik Chan,
S. Tahara,
J. F. De Marneffe,
R. Gronheid,
K. Xu,
E. Nishimura,
W. Boullart
Abstract
Directed Self Assembly recently has received a lot of attention for advanced lithography processes for sub-14nm half-pitch. In this paper, we propose a 2-step PMMA etch comprising an etching with Ar/O2, followed by an Ar soft sputtering to increase the selectivity in PMMA over PS.