Advanced optoelectronic devices, the backbone of modern communication technology, require the monolithic integration of different functions at chip level. An example of devices fulfilling this requirement are multi-quantum well (MQW) electroabsorption- modulated lasers (EMLs) employed in long-distance, high-frequency optical fiber communications technology. Such devices are realized by using the selective area growth (SAG) technique. Optimization of the growth parameters is carried out by empirical approaches as direct structural characterization of the MQW is not possible with laboratory X-ray sources, owing to the micrometer-variation of composition and thickness inherent to the SAG technique. Micrometer-resolved X-ray (m-X-ray) beam available at third generation synchrotron radiation sources, such as the ID22 at the European Synchrotron Radiation Facility (ESRF), allowed us to directly measure the determinant structural parameters of MQW EML structures such as well and barrier widths and mismatches with a 2 mm spatial resolution.