Published in
IOP Publishing, Plasma Sources Science and Technology, 1(19), p. 015012, 2009
DOI: 10.1088/0963-0252/19/1/015012
Links
Tools
The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si: H thin films
Journal article published in 2009 by
It Ina Martin,
I. T. Martin,
Ma Michael Wank,
M. A. Wank,
M. A. Blauw,
R. A. C. M. M. van Swaaij 
,
Ma Michiel Blauw,
Racmm René van Swaaij,
Wmm Erwin Kessels,
W. M. M. Kessels,
M. C. M. van de Sanden,
Mcm Richard van de Sanden
,
Ma Michiel Blauw,
Racmm René van Swaaij,
Wmm Erwin Kessels,
W. M. M. Kessels,
M. C. M. van de Sanden,
Mcm Richard van de Sanden
This paper is available in a repository.
Full text: Download
Published version:
archiving forbidden
Data provided by 