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Springer (part of Springer Nature), Applied Physics A: Materials Science and Processing, 1(104), p. 447-451
DOI: 10.1007/s00339-011-6257-8
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SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition
Journal article published in 2011 by
L. Yan,
Z. L. Xu,
C. Grygiel,
S. R. C. McMitchell,
M. R. Suchomel 
,
J. Bacsa,
J. H. Clark,
Hongjun J. Niu,
S. Romani,
Paul R. Chalker ,
R. G. Palgrave ,
Matthew J. Rosseinsky
,
J. Bacsa,
J. H. Clark,
Hongjun J. Niu,
S. Romani,
Paul R. Chalker ,
R. G. Palgrave ,
Matthew J. Rosseinsky
This paper is available in a repository.
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