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Published in

IOP Publishing, Japanese Journal of Applied Physics, 5(62), p. 055503, 2023

DOI: 10.35848/1347-4065/accfd8

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Thermodynamic analysis of molecular beam epitaxy of group-III sesquioxides

Journal article published in 2023 by Rie Togashi ORCID, Ken Goto ORCID, Masataka Higashiwaki ORCID, Yoshinao Kumagai ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Abstract Thermodynamic analyses for the growth of group-III sesquioxides, including α-Al2O3, β-Ga2O3, and c-In2O3, by both ozone and plasma-assisted MBE were performed. In either case, under O-rich conditions, the driving force for III2O3 (III = Al, Ga, In) growth ( Δ P III 2 O 3 ) increased with increasing input partial pressure of the group-III metal ( P III o ), without generation of metal droplets. Conversely, under group-III-metal-rich conditions, Δ P III 2 O 3 decreased with increasing P III o and/or decreasing input partial pressure of O3 or O. This decrease was caused by the formation of Ga2O or In2O during growth of β-Ga2O3 and c-In2O3. The decrease of Δ P Al 2 O 3 was smaller because the equilibrium constant of α-Al2O3 formation reaction was very large. Ga and In droplets formed at low temperatures (<420 °C), whereas Al droplets were formed at high temperatures (<820 °C), and the order that enabled growth at higher temperatures was c-In2O3 < β-Ga2O3 << α-Al2O3.