Dissemin
Language
العربيّة
Deutsch
English
Español
Suomi
Français
한국어
Македонски
Português
Português Brasileiro
Русский
Svenska
Türkçe
简体中文
繁體中文
Login
Dissemin
Ivan Bozhev
Bozhev, 1970
Links
ORCID
Tools
Export citation
×
Format
BibTeX
@article{Bozhev1970, author = {Bozhev, Ivan}, month = {jan}, title = {Method of dry electron-beam lithography involves, applying layer of resist which is low-molecular-weight polystyrene}, year = {1970} }
Export citation
Search in Google Scholar
Method of dry electron-beam lithography involves, applying layer of resist which is low-molecular-weight polystyrene
Journal article published in 1970 by
Ivan Bozhev
This paper was not found in any repository; the policy of its publisher is unknown or unclear.
Full text:
Unavailable
Preprint
: policy unknown
Upload
Postprint
: policy unknown
Upload
Published version
: policy unknown
Upload