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Elsevier, Thin Solid Films, (793), p. 140272, 2024

DOI: 10.1016/j.tsf.2024.140272

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Highly oriented crystalline si on epitaxial Gd2O3/Si(111) substrate using low-cost Radio Frequency sputtering for Silicon on Insulator application

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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